MTI | SKU:
OTF-1200X-DVD-M
Forno a tubo da 1200°C Max (ID 3") con funzione di scorrimento del campione sotto vuoto elevato - OTF-1200X-DVD-M
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Forno a tubo da 1200°C Max (ID 3") con funzione di scorrimento del campione sotto vuoto elevato - OTF-1200X-DVD-M
MTI
OTF-1200X-DVD-M is a splittable tubular furnace with a crucible sliding function (manually pushing ) in a high vacuum or air-tight atmosphere, with a maximum temperature of 1200 °C. The vacuum-sealed manual push crucible is actualized by a magnetic coupling vacuum push system. This equipment can carry out titanium sheet annealing treatment, rapid heat treatment, HPCVD, rapid thermal evaporation (RTE), and direct vapor deposition (DVD) in various atmospheres.
SPECIFICATIONS:
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Power
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Working Temperature
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Max. 1200°C (<30 min)
Continuous: 1100°C ( ) Max. Heating Rate: <= 10 °C/min Temperature Accuracy: +/- 1°C |
Heating Zone
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400mm Length
You shall measure the furnace temperature profile for your own application before making film growth. |
Tube Size
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Quartz tube: 100 O.D x 95 I.D x 1000 L (mm)
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Dimensions
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2100X410X690mm
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Net Weight
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130 Kg
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Warranty
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One-year limited warranty with lift time support (Consumable parts such as processing tubes and O-rings are not covered by the warranty. |
Compliance
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Demo Video |