MTI | SKU:
OTF1200XSHPCVD
Forno tubolare a 1200 C con meccanismo di spostamento interno per HPCVD - OTF-1200X-S-HPCVD
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Forno tubolare a 1200 C con meccanismo di spostamento interno per HPCVD - OTF-1200X-S-HPCVD
MTI
OTF-1200X-S-HPCVD is a compact 2" split tube furnace with an internal sample traveling system inside the processing tube. This allows the position & temperature control of the sample stage or crucible via touch screen digital controller. It is designed for multi-functional rapid thermal processing, such as hybrid physical-chemical deposition(HPCVD), rapid thermal evaporation (RTE), and as well Horizontal Bridgman Crystal Growth ( HDC) under various atmospheres for new-generation crystal research.
SPECIFICATIONS:
Split Tube Furnace
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Temperature Control
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Vacuum Sealing
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Internal Traveling Mechanism & PLC Control Panel |
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Max. Heating & Cooling Rate |
The max heating and cooling rate can be achieved by moving the sample into the pre-heated hot zone and moving the sample out from the hot zone. The typical ramp/cool rate is listed in below:
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Optional Parts |
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Compliance |
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Operation Video | ||||
Application Notes | This multi-functional furnace is suitable for the applications in below:
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