ALD/CVD/PVD

MTI

1200C Max. PECVD Tube Furnace w/ 4 Channels Gas Delivery & Vacuum Pump - OTF-1200X-PEC4LV

MTI

1200C Max Two-Zone PECVD Tube Furnace (50 mm OD) with Pre-Heater and Auto-Sliding - OTF-1200X-II-50-PEMSL

MTI

1200C Dual Sliding Tube Furnace with 2 Tube & Flanges for PECVD - OTF1200XSDFPESL

MTI

1100C PECVD Rotary Furnace with Vacuum Pump - OTF-1200X-S-II-PECVD

MTI

1100C PE-HPCVD Rotary Furnace with In-situ Evaporator, 4 Channel MFC & Vacuum Pump - OTF-1200X-S-II-PEC4

MTI

300W 13.56MHz RF Generator for 50, 80 or 125 mm OD Tube Furnace - OTF-PECVD-RF

MTI

1200°C MIST CVD Furnace for Crystal Growth- OTF-1200X-Mist

MTI

Two Channels ALD 4" Tube Furnace System Upto 1200C - ALD-1200X-4

MTI

Small Batch (12 pcs 6" Wafer) PECVD System ( CCP type ) for Pilot Test - PECVD-8-16

MTI

Rotation Powder ALD 4" Tube Furnace System Upto 1200C - ALD-1200X-R-4

MTI

Roll to Roll PE-CVD System for Continuous Film Growth on Wire or Foil - OTF-1200X-II-PE-RR

MTI

Mini CVD Tube Furnace with 2 Channel Gas Mixer, Vacuum Pump, and Vacuum Gauge - OTF-1200X-S50-2F

MTI

1200C Three Zone HPCVD 5"D Tube Furnace with Sequential & Co-Deposition Source Feeding System up to 3 Crucibles - OTF-1200X-III-HPCVD-S3

MTI

Horizontal Directed Crystallization (HDC) Tube Furnace, 1100C Max. - OTF-1200X-50-DSL

MTI

1650 Steam Oxidation-Corrosion Furnace GSL-1700X-80CVD

MTI

1600°C Max. MIST/LPCVD System up to 6" Wafer - MIST-1600-6

MTI

1600°C Max. MIST CVD Furnace for Continuous Growth of Carbon Nanotube - GSL-1600X-CFM

MTI

1200C Max. Ultrasonic Spray Pyrolysis 3-Zone Furnace for Nano Particles Synthesis - OTF-1200X-III-PGEP

MTI

1200C Max. Slid-able Dual Zone PECVD Furnace w/ Gas Delivery & Vacuum Pump - OTF-1200X-II-PEC4SL-LD

MTI

1200C Max. Microwave Plasma Enhanced CVD (MPECVD) Furnace with 1''-2'' Quartz Tube - OTF-1200X-S-MPECVD