ALD/CVD/PVD

MTI

1200C Max Dual Sliding Tube Furnace with 50 mm Tube Flanges for TCVD - OTF-1200X-S-50-DFSL

MTI

1200C Dual Zone Split Tube Furnace w/ Sample Feeding System upto 4 Crucibles For HPCVD - OTF-1200X-II-ZL

MTI

1100C 15 Rotary Furnace w/ 3 Zones and Powder Feeding For Powder CVD - OTF-1100X-R-15-AF

MTI

1200°C Microwave Plasma Assisted CVD Rotary Furnace w/ 2" Tube - GSL-1200R-MWPE

MTI

Tube Furnace w/ Hi-Vacuum (1E-4 torr) & 3 Channel Gas Flow Station for CVD - OTF-1200X-HVC3-series

MTI

Three Zones Tube Furnace (4") with Vacuum Pump (1.0E-4 torr) + 9 Channel Digital Gas Flow-meters for CVD - OTF-1200X-4-III-9HV

MTI

Three Zones Tube Furnace (1200C) with High Vacuum Station (1.0E-4 torr) + 4 Channel MFC Gas Station for CVD - OTF-1200X-III-HVC-LD

MTI

Three Zones CVD Tube Furnace with 8.5" Quartz Tube & Slidable Flange (1100C) - GSL-1100X-8.5-III-SR

MTI

High Vacuum Plasma-enhanced Chemical Vapor Deposition (CCP type) - VTC-PECVD

MTI

Furnace w/ 1.7MHz Ultrasonic Spraying up to 1800C for Special-Particle Formation - GSL-1800X-PGEP

MTI

Economic MIST CVD Furnace (1200°C Max. ) for Crystal Growth- OTF-1200X-S-Mist

MTI

Dual-Tube (11"/10") CVD Furnace (1200°C Max.) for Large-Area Graphene Growth -GSL-1100X-III-D11

MTI

Dual Quartz Tubes (5"/4") & Three Zones CVD Furnace upto 1200C for Graphene Film - OTF-1200X-III-D5-4

MTI

Compact Liquid Vaporization Systems with Temperature and Pressure Control for CVD & DLCVD - LVD-F1

MTI

800°C Plasma Enhanced Atomic Layer Deposition (PE-ALD) System W/ 4" Rotary Stage - ALD-800X-4-PE

MTI

5" PECVD Split Tube Furnace (1200C Max.) with Vacuum Pump Station - OTF-1200X-5L-PE

MTI

Compact Auto-Sliding PECVD Furnace w/ 2" Tube and Vacuum Pump, Max. 1200C - OTF-1200X-S50-PESL

MTI

Compact 5" Two Zone Rotary Tube Furnace @1100C Max For Powder CVD - OTF-1200X-S-II-R5

MTI

Compact 2" Two Zone Rotary Tube Furnace @1100C Max For Powder CVD. - OTF-1200X-S-R-II

MTI

ALD & PECVD Combination Tube Furnace System - OTF-1200X-ALD