MTI  |  SKU: GESbc101D05C1R0014US

Ge Wafer (111) 4" dia x 0.5 mm, 1SP, N type ( Sb- doped) with resistivities: 0.014-0.022 Ohms-cm

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Ge Wafer (111) 4" dia x 0.5 mm, 1SP, N type ( Sb- doped) with resistivities: 0.014-0.022 Ohms-cm

MTI

Ge Wafer Specification

  • Growing Method:          CZ
  • Orientation:                  (111) +/-0.5 Deg.
  • Wafer Size:                  4" dia x  500 microns  
  • Surface Polishing:         One   side  epi polished
  • Surface roughness:       < 30 A ( by AFM)
  • Doping:                        Sb- Doped
  • Conductor type:            N-type
  • Resistivity:                    0.014-0.022 Ohm-cm (If you would like to measure the resistivity accurately, 
                                       please order our
     Portable 4 Probe Resistivity Testing Instrument.)
                             
  • Package:                      under 1000 class clean room         

Typical Properties:

  • Structure:                     Cubic, a = 5.6754Å
  • Density:                        5.323 g/cm3 at room temperature
  • Melting Point:                937.4 oC
  • Thermal Conductivity:     640