MTI  |  SKU: GEUe50D05C1R50US

Ge Wafer (110) N-type Undoped, 2" dia x 0.5 mm, 1SP, R:>50 ohm.cm

€275,94


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Ge Wafer (110) N-type Undoped, 2" dia x 0.5 mm, 1SP, R:>50 ohm.cm

MTI

Ge Wafer Specification

  • Growing Method:                    CZ
  • Orientation:                            (110) +/_0.5 Deg.
  • Wafer Size:                            2" dia x  500 microns  
  • Surface Polishing:                  one side optical polished
  • Surface finish (RMS or Ra) :    < 30A
  • Doping:                                 Undoped
  • Conductor type:                     N-type
  • Resistivity:                             > 50Ohms/cm (If you would like to measure the resistivity accurately, 
                                               please order our
     Portable 4 Probe Resistivity Testing Instrument.)
  • EPD:                                     < 5E2 /cm^2
  • Package:                              under 1000 class clean room      

Typical Properties:

  • Structure:                            Cubic, a = 5.6754 A
  • Density:                               5.323 g/cm3 at room temperature
  • Melting Point:                       937.4 oC
  • Thermal Conductivity:           640