MTI  |  SKU: GESba50D05C1R40deg07US

Ge Wafer (100) +/-0.7 Degree 2" dia x 0.45 mm, 1SP, N type ( Sb doped), R:>40 ohm-cm

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Ge Wafer (100) +/-0.7 Degree 2" dia x 0.45 mm, 1SP, N type ( Sb doped), R:>40 ohm-cm

MTI

Ge Wafer Specification

  • Growing Method:               CZ
  • Orientation:                       (100) +/-0.7 Deg.
  • Wafer Size:                       2" dia x  450 microns  
  • Surface Polishing:             one side epi polished
  • Surface roughness:           ~10 A ( by AFM)
  • Doping:                            Sb Doped
  • Conductor type:                N-type
  • Resistivity:                       >40 ohm-cm  (If you would like to measure the resistivity accurately, 
                                           please order our
     Portable 4 Probe Resistivity Testing Instrument.)                
  • Package:                         under 1000 class clean room      

Typical Properties:

  • Structure:                        Cubic, a = 5.6754 Å
  • Density:                          5.323 g/cm3 at room temperature
  • Melting Point:                  937.4 oC
  • Thermal Conductivity:       640