Boron Nitride Film on Silicon Wafer, 24 nm / 4" -- BN-Si-100-24nm - FmBNonSia100D0525C1FT24nm

Boron Nitride Film

Boron nitride is a chemical compound with the chemical formula BN, consisting of equal numbers of boron and nitrogen atoms.  BN film is  amorphous t     Its hardness is inferior only to diamond, but its thermal and chemical stability is superior.  Low-pressure deposition of thin films of boron nitride is grown on Si (100) wafers for this product by sputtering

• BN Film coated by sputtering method
• The amorphous structure  ( no orientation)
• Dielectric
• BN Thickness:  24 nm +/- 10%
• Purity: > 99.99%

Silicon Wafer Specifications:

• Conductive type:        Si   n-type
• Resistivity:                  0.1-1.0 ohm-cm
• Size:                          4" diameter +/- 0.5 mm   x 0.525 +/- 0.025 mm ( thickness)
• Orientation:                (100) +/- 0.5^o
• Polish:                        One  sides  polished
• Surface roughness:     Prime
• Packing:                      Vacuum packed on a 4" single wafer carrier box

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