MTI | SKU:
VBF-1050X-H8
Atmosphere Controlled RTP Furnace for 8" Wafer up to 1000 °C - VBF-1050X-H8
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Atmosphere Controlled RTP Furnace for 8" Wafer up to 1000 °C - VBF-1050X-H8
MTI
VBF-1050X-H8 is an atmospherically controlled box furnace with IR heating lamps, which can reach 1000ºC with a 5ºC/second heating rate. It is designed for rapidly annealing thin wafers up to 8" round or 6"square in diameter under vacuum and inert gases
SPECIFICATIONS