MTI | SKU:
OTF1200XPELV5
5" PECVD Split Tube Furnace (1200C Max.) with Vacuum Pump Station - OTF-1200X-5L-PE
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5" PECVD Split Tube Furnace (1200C Max.) with Vacuum Pump Station - OTF-1200X-5L-PE
MTI
OTF-1200X-5L-PE is a PE-CVD (Plasma Enhanced Chemical Vapor Deposition) tube furnace system, which consists of 300W RF plasma source, 130ODx122ID, mm quartz tube furnace, and high-quality vacuum pump with a cold trap. The PE-CVD furnace is an ideal and affordable tool to deposit thin films or grow nanowire from a gas state (vapor) up to 4" wafer.
(item number has been updated from OTF-1200X-5L-I-PE since March 2019)
(item number has been updated from OTF-1200X-5L-I-PE since March 2019)
Specifications
Single Zone 1200°C Split Tube furnace
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Pressing Tube
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Vacuum Pump and valve
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Temperature Controller
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Optionals |
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Dimensions
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Warranty
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One year limited warranty with lift time support (Consumable parts such as processing tubes, o-rings, and heating elements are not covered by the warranty, please order the replacement at related products below.) |
Laptop, software & WiFi Control (Optional)
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Compliance |
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Operation Instruction
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