3 Heads RF/DC Plasma Sputtering Coater for Powders with 1 PPM Gas Purification System - VTC-3HD-VP
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Delivery and Shipping to EU
Delivery and Shipping to EU
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3 Heads RF/DC Plasma Sputtering Coater for Powders with 1 PPM Gas Purification System - VTC-3HD-VP
MTI
VTC-3HD-VP is a three-head 1" RF Plasma magnetron sputtering system designed for powder coating to form various core cells structure. DC and RF power sources are included for coating both metallic and insulation material. The vibration sample holder is built inside the chamber to make powder jumping during the coating, and the gas purification system is used to replace turbopump and provide O2 and H2O less than 1 ppm environmental fro better quality coating.
SPECIFICATIONS
Input Power![]() |
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Source Power |
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Sputtering Target |
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Vacuum Chamber |
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Optional![]() |
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Compliance |
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Optional |
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