Hybrid PVD Coater in Glove-box: One 2" RF Sputtering + Two Evaporation Sources - VTC-H3-GB

Input Power

• AC 208-240V Single Phase, 50/60 Hz
• 1.5 KW (for glove box); 2.5 KW ( for PVD coaters)
• Total:  4.0 KW

• Chamber dimension: 1200 mm L x 740 mm W x 900 mm H
• The gas purification station is included to ensure  O2 & H2O less than 1ppm) in the glove box.
• Case Material: Stainless steel 304 with 3 mm thickness
• Chamber dimension: 1200 mm L x 740 mm W x 900 mm H
• Openable front window panel (tempered glass, 8 mm thick)  for easy device loading
• Please Click Picture left for detail specification

• The vacuum chamber is made of  SS304 and recessed in the bottom of the glovebox
• The top flange is the hinged type and operable manually
• Two quartz windows are installed in the chamber fro observation.
• Plasma sputtering head and two evaporation heater are installed on the bottom of the chamber.
• One rotary sample holder is built-in the top of the flange which can hold max. 4" sample
• Rotating speed: 5 rpm
• One rotary shutter is built-in the bottom of the flange, which will cover two coating source during one source working to avoid the cross-contamination.
  

• One 13.5 MHz, 300 W RF Generator with automatic matching function is installed in the outside glovebox and connected to 2" sputtering head (click picture 1 to see detailed specs).
• One 2" Magnetron Sputtering Heads with water cooling jackets are inserted into the vacuum chamber from the bottom of the glovebox. (click picture 2  to see detailed specs).
• One 16 L/min digitally controlled recirculation water chiller is included for cooling magnetron sputtering heads  (click the picture 3 to see detailed specs).
•  The RF sputtering head can despite either insulation material  or conductive material 
• Pic.1 Pic. 2    Pic.3

• Two tungsten coil heaters with two B type of thermocouples and Alumina crucibles are built at the bottom of the vacuum chamber ( See Pic. 1)
• One digital temperature controller with 30 programmable segments and +/- 1 ºC accuracy  to control the heater (PIC. 2)
• One power switch is installed to change heating from one crucible to another by the same temperature controller 
• Working temperature:        200ºC - 1700ºC
• Recommend Heating rate:  0.3 ºC/s (RT-1200 ºC) and 15 ºC/s  (1200ºC - 1700 ºC)
• Four alumina crucibles (up to 1700 ºC) and two tungsten coil heaters are included. Please refer to the Optional section for ordering spare parts.
•  Pic. 1    Pic. 2

Vacuum Pump

• The KF25 vacuum port is installed to connect to a vacuum pump
• The highest vacuum may reach <4.0E-6 Torr by pumping overnight with optional Turbopump
• Anti-Corrosive Capacitance Diaphragm Gauge is included for vacuum up to 1.0E-6 TorPic.1
• A vacuum pump is optional. Please click Pic. 2 or 3 to order  Double-Stage Rotary Vane Vacuum Pump  ( 10-2 torr) or turbopump  ( 10-5 torr)
• Pic. 1 Pic. 2   Pic. 3  
  

In-Situ Film Thickness Monitor
      (Optional)

•  In-situ high precision thickness monitor for the thin film deposition process is recommended.  It is based on the principle that the mass of a deposited film on a quartz crystal can be measured by monitoring the change in crystal’s oscillating frequency.
• Thickness accuracy:   0.1 Š        
• Please click the picture left to see detailed specifications.

Net Weight

Warranty 

Compliance
    

• CE Certified
• NRTL certification (UL61010)  or CSA certification is available upon request at extra cost.

Operation Instructions