MTI | SKU:
OTF-1200X-II-ZL
1200C Dual Zone Split Tube Furnace w/ Sample Feeding System upto 4 Crucibles For HPCVD - OTF-1200X-II-ZL
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1200C Dual Zone Split Tube Furnace w/ Sample Feeding System upto 4 Crucibles For HPCVD - OTF-1200X-II-ZL
MTI
OTF-1200X-II-ZL is a hybrid PVD and CVD ( HPCVD) deposition system with four evaporation sources for preparing multilayer 2D materials up to 1200oC. The system is consists of a dual-zone split tube furnace with the revolving sample feeding system that can drive the crucible into a processing tube at the desired temperature in the different position of the heating zone. The revolving feed system can push and draw a crucible with evaporation material through the atmosphere controlled tube furnace and sequentially evaporate the material one by one up to four crucibles as the program. Its built-in PLC touchscreen allows users to manage the feeding method and monitor the temperature of each sample. Two 30-segment programmable PID temperature controllers provide excellent control without temperature overshooting.
SPECIFICATIONS:
SPECIFICATIONS:
Furnace Structure![]() ![]() |
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Power Requirement |
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Heating Zone Length |
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Constant Temp. Zone![]() |
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Temperature Range | 100~1100°C (Continuous); 1200°C (<1 hour) |
Max. Heating Rate | ? 20°C /min |
Revolving Feeding Stock System |
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Crucible Movement Control | |
Temperature Controllers![]() ![]() |
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Tube Accessories |
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Digital Vacuum Gauge![]() |
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Vacuum Pump![]() |
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Gas Flow Control System![]() |
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Water Chiller![]() |
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Dimensions |
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Warranty | One year limited warranty with lifetime support. (Consumable parts such as processing tubes, o-rings are not covered by the warranty, please find the replacements at related products below.) |
Laptop, software & WiFi Control (Optional) |
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Application Notes![]() Click here to learn the installation of a gas regulator. |