MTI  |  SKU: FmGaNonALC50D05C1FT20umSemiUS

GaN Template on Sapphire(0001) 2"x 0.5mm,1sp ,GaN Film: 20um ,Semi-insulated--Research Grade

€1.489,25


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GaN Template on Sapphire(0001) 2"x 0.5mm,1sp ,GaN Film: 20um ,Semi-insulated--Research Grade

MTI

GaN Template on saphhire is made by a hydride vapor phase epitaxy (HVPE)-based method. During the HVPE process, HCl reacts with molten Ga to form GaCl, which in turn reacts with NH3 to form GaN.  GaN template is a cost effective way to replace GaN single crystal substrate.


Specifications

        Research Grade

  • Sizes 2” Round
  • Dimensions 50mm +/- 2mm
  • Substrate Sapphire,  Orientation c-axis (0001) +/- 1.0 o
  • Conduction Type: n-type,
  • Resistivity > 1E6 Ohm-cm
  • Front Surface Finish (Ga Face) As-grown
  • Back Surface Finish Sapphire as-received finish
  • Useable Surface Area >90%
  • Edge Exclusion Area 1mm
  • Package Single Wafer Container
  • GaN layer thickness   20 microns , (+/- 10%)

Macro Defect Density:            <=10 cm^-2

Lattice Constant Mismatch:   14%  mismatch
Dislocation Density:              5x10^9/ cm^2


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