MTI | SKU:
OTF-1200X-S-II-PECVD
1100C PECVD Rotary Furnace with Vacuum Pump - OTF-1200X-S-II-PECVD
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1100C PECVD Rotary Furnace with Vacuum Pump - OTF-1200X-S-II-PECVD
MTI
OTF-1200X-S-II-PECVD is a 1000ºC Rotatable Two-Zone Plasma-Enhanced Chemical Vapor Deposition (PE-CVD) system. It consists of a 300W RF (Ratio Frequency) Plasma Generator & Matching Network, and High-Performance Vacuum Pump. Such a system is an excellent tool for heat-treating inorganic compound powders with surface coating uniformity (e.g. prepare Li-Ion battery cathode powders with conductive coatings on sample surface).
SPECIFICATIONS:
SPECIFICATIONS:
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Two-Zone Rotary Furnace |
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Plasma RF Power Supply
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Tube Rotation Speed
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Vacuum Pump & Gauge
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Warranty
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One year limited warranty with lifetime support (Consumable parts such as processing tubes, O-rings, and heating elements are not covered by the warranty, please order replacements at related products below).
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Application Notes![]() |
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